Gas injection head slowing down emission speed of source gas and reaction gas and atomic layer deposition apparatus for depositing thin film including the gas injection head,申请号KR20080041686-传众专利搜索

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发明名称	Gas injection head slowing down emission speed of source gas and reaction gas and atomic layer deposition apparatus for depositing thin film including the gas injection head
摘要
申请公布号	KR100957492(B1)	申请公布日期	2010.05.17
申请号	KR20080041686	申请日期	2008.05.06
申请人		发明人
分类号	C23C16/455;C23C16/00	主分类号	C23C16/455
代理机构		代理人
主权项
地址

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