| 摘要 |
PURPOSE: A parallel 3 dimensional confocal surface profiler and a measuring method using the same are provided to be utilized as a total inspecting equipment in real time for a semiconductor industry, a solar battery, a high aspect ratio micro pattern fabrication due to the suitableness of a measuring and an inspection of a cluster type micro pattern in a two dimensional and three dimensional large area. CONSTITUTION: A parallel 3 dimensional confocal surface profiler comprises: a light generating unit(100) which directs a coaxial light source which includes a constant wavelength spacing; a light source unit(200) which forms a two dimensional light source array of M points of a light source; a scan unit(300) which uses the light source array and scans along one axis which is perpendicular to the light axis without scanning along the height direction of a sample; and a area scan detecting unit(500) which detects the light information which is scanned from the scan unit. The light source array comprises N wavelengths along the X axial.
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