PHOTORESIST RESIN COMPOSITION AND THE LIQUID CRYSTAL DISPLAY COMPRISING MICROPATTERN THEREOF

摘要

PURPOSE: A photoresist resin composition and a liquid crystal display device including a micro-pattern manufactured therefrom are provided to reduce the process time by limiting a solvent composition rate, and to obtain a uniform thin film. CONSTITUTION: A photoresist resin composition contains a solvent including 5~75% of first solvent at 110~145 deg C, 20~90% of second solvent containing propylene glycol methyl ether acetate, and 5~30% of third solvent with a boiling point lower than the propylene glycol methyl ether acetate. The composition also contains 5~85wt% of coloring dispersed solution, 1~20wt% of alkali-soluble binder resin, 1~20wt% of polyfunctional monomer with an ethylenically unsaturated bond, 0.1~20wt% of photopolymerization initiator and 50~90wt% of solvent.