发明名称 MASK, IMAGE SENSOR FABRICATED BY USING THE MASK AND FABRICATING METHOD THEREOF
摘要 <p>PURPOSE: A mask, an image sensor which is manufactured using the mask, and a method for manufacturing the same are provided to improve the fill factor of the image sensor by preventing voids from generating on the corner of color filters. CONSTITUTION: A first mask includes a plurality of first mask patterns in order to form a red color filter(133). A second mask includes a plurality of second mask patterns in order to form a blue color filter(132). A third mask(130) includes a plurality of third mask patterns and an auxiliary mask pattern in order to form a green color filter(131). The fist and the second mask patterns are a square pattern which correspond to the color filters. The third mask patterns are adjacently arranged in a diagonal direction. The auxiliary pattern connects the third mask patterns.</p>
申请公布号 KR20100051223(A) 申请公布日期 2010.05.17
申请号 KR20080110271 申请日期 2008.11.07
申请人 DONGBU HITEK CO., LTD. 发明人 CHOI, HA KYU
分类号 H01L27/146;H01L21/027 主分类号 H01L27/146
代理机构 代理人
主权项
地址