| 摘要 |
<p>PURPOSE: A plasma processing apparatus and components thereof are provided to protect a corner part from depositing by maintaining the number of ions which are injected into the unit area of the corner part. CONSTITUTION: Two sides are crossed to form at least one corner part(33e, 41c, 41e). The corner part is exposed to plasma. The range of the cross angle of two sides is from 115°to 180°. A groove(41) is formed in the corner part. The width of the groove is more than two times of the length of sheath which is formed along the components of a plasma processing apparatus.</p> |
