发明名称 METHOD FOR MANUFACTURING MICRO STRUCTURE USING X-RAY EXPOSURE
摘要 The present invention comprises: a photoresist exposure step of exposing a photoresist by a lateral exposure technique by installing an X-ray mask and irradiating an X-ray; a photoresist etching step of etching the exposed photoresist; a mold formation step of fabricating a mold having a micro pattern by filling a metal into the etched photoresist; a mold module formation step of combining a plurality of molds; and a micro structure formation step of forming a micro structure.
申请公布号 WO2010053277(A2) 申请公布日期 2010.05.14
申请号 WO2009KR06385 申请日期 2009.11.02
申请人 POSTECH ACADEMY-INDUSTRY FOUNDATION;KWON, TAI-HUN;LEE, BONG-KEE 发明人 KWON, TAI-HUN;LEE, BONG-KEE
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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