发明名称 |
SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
摘要 |
A semiconductor device (10) includes: a semiconductor substrate (11); an internal electrode (12A) and an internal electrode (12B) arranged on the surface of the semiconductor substrate (11); a first through electrode (17A) which penetrates through the semiconductor substrate (11) in the thickness direction and is electrically connected to the internal electrode (12A); and a second through electrode (17B) which is electrically connected to the internal electrode (12B). The internal electrode (12A) has a thickness greater than that of the internal electrode (12B). The second through electrode (17B) may penetrate through the internal electrode (12B). |
申请公布号 |
WO2010052933(A1) |
申请公布日期 |
2010.05.14 |
申请号 |
WO2009JP05956 |
申请日期 |
2009.11.09 |
申请人 |
PANASONIC CORPORATION;NAKANO, TAKAHIRO |
发明人 |
NAKANO, TAKAHIRO |
分类号 |
H01L23/12;H01L21/3205;H01L21/66;H01L23/52;H01L27/14;H01L31/02 |
主分类号 |
H01L23/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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