发明名称 SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 A semiconductor device (10) includes: a semiconductor substrate (11); an internal electrode (12A) and an internal electrode (12B) arranged on the surface of the semiconductor substrate (11); a first through electrode (17A) which penetrates through the semiconductor substrate (11) in the thickness direction and is electrically connected to the internal electrode (12A); and a second through electrode (17B) which is electrically connected to the internal electrode (12B).  The internal electrode (12A) has a thickness greater than that of the internal electrode (12B).  The second through electrode (17B) may penetrate through the internal electrode (12B).
申请公布号 WO2010052933(A1) 申请公布日期 2010.05.14
申请号 WO2009JP05956 申请日期 2009.11.09
申请人 PANASONIC CORPORATION;NAKANO, TAKAHIRO 发明人 NAKANO, TAKAHIRO
分类号 H01L23/12;H01L21/3205;H01L21/66;H01L23/52;H01L27/14;H01L31/02 主分类号 H01L23/12
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