发明名称 |
SURFACE TREATMENT FOR MOLECULAR BONDING |
摘要 |
<p>A method of bonding a first substrate (210) on a second substrate (220) by molecular bonding, the method comprising the following steps: ° forming a layer of insulation (212) on the bonding face (210a) of the first substrate (210); ° chemical -mechanical polishing said layer of insulation (212); ° activating the bonding surface of the second substrate (220) by plasma treatment; and ° bonding together the two substrates (210, 220) by molecular bonding; the method being characterized in that it further comprises, after the chemical -mechanical polishing step and before the bonding step, a step of etching the surface (212a) of the layer of insulation (212) formed on the first substrate.</p> |
申请公布号 |
WO2010052151(A1) |
申请公布日期 |
2010.05.14 |
申请号 |
WO2009EP64121 |
申请日期 |
2009.10.27 |
申请人 |
S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES;CASTEX, ARNAUD;GAUDIN, GWELTAZ;BROEKAART, MARCEL |
发明人 |
CASTEX, ARNAUD;GAUDIN, GWELTAZ;BROEKAART, MARCEL |
分类号 |
C03C15/00;C03C17/22;C03C27/06 |
主分类号 |
C03C15/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|