| 摘要 |
<p>A device for observation, by reflection, of the structural details of an object (2) that exhibits a behavior that is at least partially specular, located in an exposure area, which includes: at least one radiation source with an emission surface (6) possessing at least two distinct zones (26, 27) emitting streams of radiation, where at least one of the characteristics differs from one zone to the next; an optical projection system that is located in line with the radiation source in relation to the exposure zone, in the path of the radiation; an optical exposure system (18) designed to optically link the entry aperture (14) of the optical projection system and the emission surface (6); a projection surface (10) that is linked optically with the object in the exposure zone, and whose received radiation depends on the deflection on the object (2).</p> |
