发明名称 |
COMBINATORIAL APPROACH TO THE DEVELOPMENT OF CLEANING FORMULATIONS FOR GLUE REMOVAL IN SEMICONDUCTOR APPLICATIONS |
摘要 |
Embodiments of the current invention describe cleaning solutions to clean the surface of a photomask, methods of cleaning the photomask using at least one of the cleaning solutions, and combinatorial methods of formulating the cleaning solutions. The cleaning solutions are formulated to preserve the optical properties of the photomask, and in particular, of a phase-shifting photomask. |
申请公布号 |
WO2010019722(A3) |
申请公布日期 |
2010.05.14 |
申请号 |
WO2009US53624 |
申请日期 |
2009.08.12 |
申请人 |
INTERMOLECULAR, INC.;KALYANKAR, NIKHIL, D.;LANG, CHI-I;FRESCO, ZACHARY |
发明人 |
KALYANKAR, NIKHIL, D.;LANG, CHI-I;FRESCO, ZACHARY |
分类号 |
C11D7/08;B08B3/10;C11D7/30;C11D7/50 |
主分类号 |
C11D7/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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