发明名称 CHIP PEELING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND CHIP PEELING APPARATUS
摘要 <p>Provided is a chip peeling apparatus by which cracks due to a stress applied upon sliding can be reduced and a chip to be peeled can be easily peeled and taken out. In the chip peeling method, a chip (11) is peeled from an adhesive sheet (12) having a chip (11) adhered on the upper surface. The adhesive sheet (12) whereupon the chip (11) is adhered is arranged so that the chip (11) corresponds to the surface of a movable stage (17) which protrudes by a first height from a base stage (16). Then, negative pressure is introduced into a space (19) arranged between the base stage (16) and the adhesive sheet (12), the movable stage (17) is brought down to a position lower than the first height, and the movable stage (17) is slid on the base stage (16) to peel the chip (11) from the adhesive sheet (12).</p>
申请公布号 WO2010052760(A1) 申请公布日期 2010.05.14
申请号 WO2008JP70059 申请日期 2008.11.04
申请人 CANON MACHINERY INC.;NAKATSU, AKIRA 发明人 NAKATSU, AKIRA
分类号 H01L21/67;H01L21/52 主分类号 H01L21/67
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