APPARATUS FOR FORMING CERAMIC COATING FILM

摘要

An apparatus for forming a ceramic coating film with improved plasma resistance comprises a ceramic powder supply unit, a unit for dispensing a fixed amount of ceramic powder, a dispersion unit, and an ejection unit. The ceramic powder supply unit contains ceramic powder. The unit for dispensing a fixed amount of ceramic powder forms uniformly aggregated ceramic powder. The dispersion unit forms aerosol by pulverizing and dispersing the aggregated ceramic powder. The ejection unit forms a ceramic coating film with porosity of 1% or less on the surface of a substance by ejecting the aerosol onto the substance at high speed.