发明名称 Method of Positioning Patterns from Block Copolymer Self-Assembly
摘要 A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.
申请公布号 US2010120252(A1) 申请公布日期 2010.05.13
申请号 US20090482583 申请日期 2009.06.11
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 KIM HO-CHEOL;RETTNER CHARLES T.;PARK SANG-MIN
分类号 H01L21/465 主分类号 H01L21/465
代理机构 代理人
主权项
地址