发明名称 |
Method of Positioning Patterns from Block Copolymer Self-Assembly |
摘要 |
A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.
|
申请公布号 |
US2010120252(A1) |
申请公布日期 |
2010.05.13 |
申请号 |
US20090482583 |
申请日期 |
2009.06.11 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KIM HO-CHEOL;RETTNER CHARLES T.;PARK SANG-MIN |
分类号 |
H01L21/465 |
主分类号 |
H01L21/465 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|