Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.
申请公布号
US2010120251(A1)
申请公布日期
2010.05.13
申请号
US20090616896
申请日期
2009.11.12
申请人
MOLECULAR IMPRINTS, INC.;BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
发明人
SREENIVASAN SIDLGATA V.;YANG SHUQIANG;XU FRANK Y.;LABRAKE DWAYNE L.