LITHOGRAPHY SYSTEM AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide an immersion lithography system which can determine a maximum relative speed which can sufficiently confirm the fact that the loss of an immersion fluid is reduced to its allowable minimum level and can be configured not to exceed the speed.

SOLUTION: The immersion lithography system determines an allowable maximum speed of a substrate with respect to an immersion-liquid trapping structure controlling the immersion liquid on the basis of characteristics of the exposure target substrate, and limits the speed of the substrate to the liquid trapping structure to the allowable maximum speed or below during an exposure process.

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