MASK VERIFICATION METHOD, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND CONTROL PROGRAM FOR EXPOSURE CONDITION

摘要

PROBLEM TO BE SOLVED: To provide a mask verification method capable of performing an appropriate verification in accordance with a mask pattern.

SOLUTION: An optical parameter upon transferring a pattern is set in such a manner that a pattern obtained by transferring a reference pattern selected from a pattern on a mask onto a substrate satisfies target dimension conditions; and a mask pattern except for the reference pattern of the pattern on the mask is transferred by using the set optical parameter onto the substrate; and the pattern thus obtained is verified whether or not the pattern satisfies dimension specifications (STEP32-3). When the pattern is judged as not satisfying the dimension specifications, the optical parameter upon transferring a pattern is changed so that the pattern obtained by transferring the reference pattern onto the substrate satisfies the target dimension conditions (STEP32-4); and a mask pattern except for the reference pattern on the mask pattern is transferred onto a substrate by using the changed optical parameter; and the pattern thus obtained is verified whether or not the pattern satisfies dimension specification (STEP32-3).

COPYRIGHT: (C)2010,JPO&INPIT