SUPPORT MEMBER AND APPARATUS FOR TREATING SUBSTRATE WITH THE SAME

摘要

PURPOSE: A support unit and a substrate processing device including the same are provided to obtain a uniform etching rate by positioning a substrate loaded on a spin head on a right position in an edge etching process. CONSTITUTION: A substrate is loaded on a spin head(210). An eccentricity correction unit(250) corrects the eccentricity of the substrate loaded on the spin head to position the center of substrate on the rotation center of the spin head. The eccentricity correction unit includes an alignment pin and a driving unit. The alignment pins are contacted or non-contacted with the edge of the substrate. The driving unit moves the alignment pins to the contact position with the edge of the substrate.