| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect inspection device and a defect inspection method for determining whether the shape of a circuit pattern is satisfactory or not while reducing the effect of a foundation layer on a pattern forming surface of a substrate. Ž<P>SOLUTION: This defect inspection device 20 includes a lighting optical system 21, a detection optical system 22, and a detector 23. In the optical system 21, the position of an opening 4a of an aperture stop 4 can be changed so that light may come therein at an angle minimizing the intensity of regular reflective light from a repetition pattern in a plane perpendicular to the optical axis of the optical system 21 when applying light from a light source 1 to the repetition pattern of the substrate 10 via the aperture stop 4 and an objective lens 9. An image of the pupil face of the objective lens 9 is detected by the optical system 22, the image being caused by diffracted light of a plurality of orders owing to the repetition pattern of the substrate 10. Defects in the repetition pattern of the substrate 10 are detected from an acquired image of the pupil face by the detector 23. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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