发明名称 Crystallization-free glass frit compositions and frits made therefrom for microreactor devices
摘要 A borosilicate glass composition suitable for manufacturing microreactor glass frits includes 12-22 mol % B2O3=12-22; 68-80 mol % SiO2; 3-8 mol % Al2O3, 1-8 mol % Li2O, and one of 0.5±0.1 mol % ZrO2 and 1.1±0.5 mol % F. After sintering a glass frit having the borosilicate glass composition, the glass frit has a surface crystalline layer of 30 μm or less or is amorphous throughout.
申请公布号 US2010120603(A1) 申请公布日期 2010.05.13
申请号 US20100692662 申请日期 2010.01.25
申请人 CORNING INCORPORATED 发明人 MORENA ROBERT MICHAEL;MARQUES PAULO JORGE;HAGY HENRY EDWIN
分类号 C03C3/118;C03C3/093 主分类号 C03C3/118
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