METHOD FOR COATING TITANIA THIN LAYER ON METAL SURFACE

摘要

PURPOSE: A method for coating a titania thin film on the surface of a metal is provided to rapidly coat the titania thin film on the surface of the metal while preventing faults such as crack and a pin hole from being generated on the surface of the metal. CONSTITUTION: A method for coating a titania thin film on the surface of a metal comprises the following steps: washing a metal surface; and forming the titania thin film on the metal surface through a plasma-enhanced atomic layer deposition. The titania thin film has TDMAT(Trakisdimethylamidotitanium) as a precursor. The titania thin film is deposited using oxygen of plasma state as a reactive group. The deposition method comprises: a step injecting the TDMAT on a heated metal surface; a purging step for eliminating remaining precursor; injecting oxygen of plasma state to react with the TDMAT; and the purging step for removing remaining gas and by-products.