| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a pellicle for lithography for extremely decreasing the amount of exhaustion of inorganic gas by sulfuric acid, nitrogen acid, chlorine, organic acid or the like by forming an oxidized film by a plasma electrolytic oxidation method on the surface of a pellicle frame. <P>SOLUTION: This pellicle for lithography includes a pellicle film, and a pellicle frame for supporting the pellicle film. The pellicle frame is manufactured of an aluminum alloy having the oxidized film formed by the plasma electrolytic oxidation method. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
