发明名称 INTEGRATED CIRCUIT SHIELD STRUCTURE AND METHOD OF FABRICATION THEREOF
摘要 A method of forming an integrated circuit is disclosed. The method includes providing a substrate and forming on the substrate a shield structure comprising a shield member and a ground strap. The shield member comprises a non-metallic portion, and the ground strap comprises a metallic portion.
申请公布号 US2010120244(A1) 申请公布日期 2010.05.13
申请号 US20100693405 申请日期 2010.01.25
申请人 CHARTERED SEMICONDUCTOR MANUFACTURING, LTD. 发明人 LIM SUH FEI;CHEW KOK WAI;CHU SANFORD SHAO-FU;CHENG MICHAEL CHYE HUAT
分类号 H01L21/02 主分类号 H01L21/02
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