摘要 |
An exhaust gas cleaning apparatus according to the present invention includes a wall member configured to form a gas passage for allowing an exhaust gas to pass therethrough, and a mist nozzle and a water film nozzle disposed in the gas passage. The mist nozzle forms mist in the gas passage and the water film nozzle forms water film in the gas passage. The mist nozzle is disposed further upstream side in a flowing direction of the exhaust gas than the water film nozzle. Plural sets of the mist nozzle and the water film nozzle may be provided.
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