发明名称 APPARATUS AND METHOD FOR WET TREATMENT OF AN OBJECT AND FLUID DIFFUSION PLATE USED THEREIN
摘要 PURPOSE: An apparatus and a method for a wet treatment of an object and a fluid diffusion plate used therein are provided to improve the process efficiency and uniformity for preventing the re-adsorption by eliminating a dead zone within a process bath equally. CONSTITUTION: A plurality of through holes(311) passing through the top and bottom of a diffusing plate are formed on a diffusing plate(300). An internal space is limited by the top, bottom, and side of the diffusing plate. A fluid supplier supplies a processing liquid to the internal space. A plurality of fluid injection nozzles(312) penetrate top to be communicated with the internal space. In the diffusing plate, a gas supply line(320) is connected to a flow control valve to receive the gas from the outside.
申请公布号 KR20100050403(A) 申请公布日期 2010.05.13
申请号 KR20090102899 申请日期 2009.10.28
申请人 SILTRON INC. 发明人 CHOI, EUN SUCK;YI, JAE HWAN;KIM, BONG WOO;YU, HWAN SU;AHN, JIN WOO
分类号 H01L21/302;H01L21/304 主分类号 H01L21/302
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