发明名称 |
APPARATUS AND METHOD FOR WET TREATMENT OF AN OBJECT AND FLUID DIFFUSION PLATE USED THEREIN |
摘要 |
PURPOSE: An apparatus and a method for a wet treatment of an object and a fluid diffusion plate used therein are provided to improve the process efficiency and uniformity for preventing the re-adsorption by eliminating a dead zone within a process bath equally. CONSTITUTION: A plurality of through holes(311) passing through the top and bottom of a diffusing plate are formed on a diffusing plate(300). An internal space is limited by the top, bottom, and side of the diffusing plate. A fluid supplier supplies a processing liquid to the internal space. A plurality of fluid injection nozzles(312) penetrate top to be communicated with the internal space. In the diffusing plate, a gas supply line(320) is connected to a flow control valve to receive the gas from the outside. |
申请公布号 |
KR20100050403(A) |
申请公布日期 |
2010.05.13 |
申请号 |
KR20090102899 |
申请日期 |
2009.10.28 |
申请人 |
SILTRON INC. |
发明人 |
CHOI, EUN SUCK;YI, JAE HWAN;KIM, BONG WOO;YU, HWAN SU;AHN, JIN WOO |
分类号 |
H01L21/302;H01L21/304 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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