EXPOSURE APPARATUS, METHOD FOR MANUFACTURING DEVICE, AND METHOD FOR CONTROLLING EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of excellently performing exposure processing, by suppressing the influence on devices/members around a substrate caused due to leakage of a liquid that forms an immersion region.

SOLUTION: The exposure apparatus exposes a substrate by projecting an image of a pattern on the substrate via a projection optical system and a liquid. The exposure apparatus has a liquid supply mechanism which supplies the liquid between the projection optical system and the substrate. The liquid feeding mechanism stops the supply of the liquid when abnormality is detected.

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