发明名称 ULTRA THIN ALIGNMENT WALLS FOR DI-BLOCK COPOLYMER
摘要 Methods comprising providing a pre-patterned substrate having an array of thick walls, depositing a conforming layer on the pre-patterned substrate, etching the conforming layer from the top of the thick walls and the space between the walls, and etching the thick walls while leaving thin walls of conforming layer.
申请公布号 US2010119778(A1) 申请公布日期 2010.05.13
申请号 US20080270511 申请日期 2008.11.13
申请人 SEAGATE TECHNOLOGY LLC 发明人 LEE KIM YANG;KUO DAVID S.;BUECHEL DOROTHEA;PELHOS KALMAN
分类号 B32B3/30;B44C1/22 主分类号 B32B3/30
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