发明名称 Passivation Layer for a Circuit Device and Method of Manufacture
摘要 According to one embodiment of the disclosure, a method for passivating a circuit device generally includes providing a substrate having a substrate surface, forming an electrical component on the substrate surface, and coating the substrate surface and the electrical component with a first protective dielectric layer. The first protective dielectric layer is made of a generally moisture insoluble material having a moisture permeability less than 0.01 gram/meter2/day, a moisture absorption less than 0.04 percent, a dielectric constant less than 10, a dielectric loss less than 0.005, a breakdown voltage strength greater than 8 million volts/centimeter, a sheet resistivity greater than 1015 ohm-centimeter, and a defect density less than 0.5/centimeter2.
申请公布号 US2010120254(A1) 申请公布日期 2010.05.13
申请号 US20100691216 申请日期 2010.01.21
申请人 RAYTHEON COMPANY 发明人 BEDINGER JOHN M.;MOORE MICHAEL A.;HALLOCK ROBERT B.;ALAVI KAMAL TABATABAIE;KAZIOR THOMAS E.
分类号 H01L21/302;H01L21/461 主分类号 H01L21/302
代理机构 代理人
主权项
地址