LITHOGRAPHIC APPARATUS AND MEASUREMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a method of exactly correcting a process-dependent offset error of a level sensor and having high cost-effectiveness.

SOLUTION: The method of exposing a substrate W (e.g. a substrate in a lithographic apparatus comprising a substrate table to support a substrate) includes: a step of performing first and second height measurements of a part of at least one substrate W using first and second sensors 10, 11; a step of generating and storing an offset error map based on a difference between the measurement values; a step of generating and storing a height map of a plurality of portions of the substrate W (or another substrate subjected to the processing similar to that of the part) by executing height measurements using the first sensor 10 and correcting this height map by the offset error map; and a step of exposing the substrate W (or the other substrate).

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