| 发明名称 |
ALLYL-CONTAINING PRECURSORS FOR THE DEPOSITION OF METAL-CONTAINING FILMS |
| 摘要 |
Methods and compositions for depositing a film on one or more substrates include providing a reactor with at least one substrate disposed in the reactor. At least one metal precursor is provided and at least partially deposited on the substrate to form a metal containing film.
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| 申请公布号 |
US2010119406(A1) |
申请公布日期 |
2010.05.13 |
| 申请号 |
US20090613732 |
申请日期 |
2009.11.06 |
| 申请人 |
DUSSARRAT CHRISTIAN;LANSALOT-MATRAS CLEMENT |
发明人 |
DUSSARRAT CHRISTIAN;LANSALOT-MATRAS CLEMENT |
| 分类号 |
B05D5/12;C22C5/04 |
主分类号 |
B05D5/12 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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