| 摘要 |
<p>A lighting optical apparatus can be configured to cope with both the suppression of bad influence of image formation due to a field stop and the improvement of an uniform distribution of an exposure amount in the case where the lighting optical apparatus is applied to photolithography equipment that uses a reflection type original sheet, for instance. A lighting optical apparatus is set to light a second surface that is optically conjugate with a first surface through the reflection type original sheet (M) that can be arranged at the first surface. The lighting optical apparatus is provided with a first partial field stop (21) arranged to define a first outer edge of a lighting region to be formed on the second surface in order to limit a light flux incident on the first surface, and a second partial field stop (22) arranged to define a second outer edge of a lighting region in order to limit a light flux reflecting from the reflection type original sheet that can be arranged on the first surface. A first distance (D1) between the first partial field stop and the first surface is set to be larger than a second distance (D2) between the second partial field stop and the first surface.</p> |
