| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a technique for calibrating a measuring instrument including an imaging sensor in the state where the measuring instrument is mounted on an exposure apparatus. <P>SOLUTION: The exposure apparatus having an optical system for exposing a substrate by illuminating an original to project a pattern of the original onto the substrate includes: a measuring instrument 200 which includes an imaging sensor 250 and measures characteristics of the optical system on the basis of a light intensity distribution formed on an imaging surface of the imaging sensor through the optical system; a calibration pattern which forms a light intensity distribution having a known pattern on the imaging surface; and a control part 190 which calibrates the measuring instrument on the basis of the light intensity distribution actually formed on the imaging surface with the calibration pattern and a computational light intensity distribution which can be formed on the imaging surface with the calibration pattern. <P>COPYRIGHT: (C)2010,JPO&INPIT |
