| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate cleaning brush capable of satisfactorily cleaning a substrate, and to provide a substrate processing apparatus and a substrate cleaning method using the substrate cleaning brush. Ž<P>SOLUTION: In the substrate processing apparatus (1) which cleans a substrate (2) by using the substrate cleaning brush (32), the substrate cleaning brush (32) includes: an elastic brush base part (33); a base surface layer part (34) which is formed on a surface of the brush base part (33) and has a hydrophobic property; and cleaning brush parts (35) implanted in the base surface layer part (34) at intervals. The brush base part (33) is formed of a water absorbing material, and a cleaning liquid supply means (39) for supplying a cleaning liquid to the brush base part (33) is provided. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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