| 发明名称 |
COMPOSITION FOR RADICAL POLYMERIZATION AND METHOD OF FORMING PATTERN USING THE COMPOSITION |
| 摘要 |
A composition for radical polymerization includes a photosensitive material, a photoinitiator, a solvent, and a material for adjusting a size of a pattern. A method of forming a pattern using the composition is also disclosed.
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| 申请公布号 |
US2010119976(A1) |
申请公布日期 |
2010.05.13 |
| 申请号 |
US20090479151 |
申请日期 |
2009.06.05 |
| 申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK JONG-JIN;LEE KWANG-HEE;BULLIARD XAVIER;CHOI YUN-HYUK;LEE KWANG-SUP |
| 分类号 |
G03F7/004;G03F7/20 |
主分类号 |
G03F7/004 |
| 代理机构 |
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