| 摘要 |
PROBLEM TO BE SOLVED: To provide a defect inspection device and a defect inspection method for determining whether the shape of a circuit pattern is satisfactory or not while reducing the effect of a foundation layer on a pattern forming surface of a substrate. SOLUTION: This defect inspection device 20 for inspecting defects in the substrate 10 with a repetition pattern formed thereon includes a lighting optical system 21, a detection optical system 22, and a detector 23. In the optical system 21 comprising an objective lens 9, light from a light source 1 is applied to the repetition pattern formed on the substrate 10 via the objective lens 9. In the optical system 22, an image of the pupil face of the objective lens 9 is detected, the image being caused by diffracted light of a plurality of orders owing to the repetition pattern. In the detector 23, defects in the repetition pattern of the substrate 10 are detected from the acquired image of the pupil face. In the detector 23, a pupil face image formed out of light of a first wavelength is corrected by using the luminance value of a pupil face image formed out of light of a second wavelength different from the first wavelength, and defects in the repetition pattern of the substrate 10 are detected from the corrected luminance value. COPYRIGHT: (C)2010,JPO&INPIT |
