| 摘要 |
<p>PURPOSE: An optical proximity correction model forming method for an asymmetric pattern is provided to improve correction of an optical proximity correction in an asymmetric pattern on an image simulation by respectively setting image parameter and an edge placement error value on left and right parts. CONSTITUTION: An original data base with a plurality of patterns is inputted(S1). The original data base is simulated to an aerial image corresponding to luminous intensity(S2). The image parameters on left and right parts corresponding to the original data base pattern among the aerial image are respectively extracted and stored(S3). An edge placement error value is stored corresponding to the extracted image parameter(S4).</p> |
