发明名称 |
CHARGED PARTICLE BEAM DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To realize an inexpensive charged particle beam device equipped with a stage system of small size and high performance, corresponding to enlargement and miniaturizing of a diameter of a semiconductor wafer. SOLUTION: An end of a rotation arm 12 is supported by a rotation arm support axis and revolves above an arc guide 13 supporting a lower surface part of the other end part of the arm 12. The rotation arm 12 is driven by an ultrasonic motor 14 in contact with a tip of the rotation arm 12, and a rotation angle of the rotation arm 12 is detected by a rotation angle detector 16. The ultrasonic motor 14 can deliver the rotation arm 12 in step with extremely high accuracy by pulse driving. Since the rotation arm 12 is supported and rotated by a rotation support bearing 15 with the other end revolving on the arc guide 13, its stiffness is improved so as to prevent looseness in up and down directions. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010108640(A) |
申请公布日期 |
2010.05.13 |
申请号 |
JP20080277122 |
申请日期 |
2008.10.28 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
OTAKA TADASHI;ITO HIROYUKI;ISHII RYOICHI;YANO MANABU;KAWANO HAJIME |
分类号 |
H01J37/20;H01L21/66;H01L21/68 |
主分类号 |
H01J37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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