| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of removing metal contaminants in a substrate cleaning process. Ž<P>SOLUTION: In a wet send indexer station 110, the surface state of a substrate is changed from a hydrophobic property to a hydrophilic property. The method is used so that the surface state of the substrate is changed without increasing surface metal contamination at the process step. To conduct this method, the substrate is dipped in citric acid or a hydrogen peroxide solution. The pH level of the solution is adjusted in approximate 6.5 to 14 by adding a basic mixture selected from ammonium hydroxide and choline and tetramethyl ammonium hydroxide. The method is applied to a both-surface brush scrubber. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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