发明名称 METHOD FOR DETECTING ABNORMAL PLACEMENT STATE OF SUBSTRATE, SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method for finding the abnormal placement state of a substrate to a substrate placing table at an early stage. SOLUTION: When processing the substrate while heating the substrate placed on the substrate placing table having heaters on it in a substrate processing apparatus, in the whole or a part of time while one substrate is processed, the maximum value and the minimum value or the integrated value are calculated for supplied power, supplied current or supplied voltage to the heaters or measured temperature of the substrate placing table, and the abnormal placement state of the substrate is detected on the basis of the detected maximum value and the minimum value or the integrated value. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010109350(A) 申请公布日期 2010.05.13
申请号 JP20090225983 申请日期 2009.09.30
申请人 TOKYO ELECTRON LTD 发明人 KAYANO TAKASHI;GOMI AKISHI;MIYASHITA KOICHI;NAGASAWA MINORU;EDA TOSHIE
分类号 H01L21/683;C23C16/52;H01L21/205;H01L21/3065 主分类号 H01L21/683
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