| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask alignment device capable of precisely aligning a mask regardless of the material of the mask. Ž<P>SOLUTION: The mask alignment device for aligning the mask for forming a pattern with a substrate on which thin film pattern is patterned includes: an alignment stage 10; a mask sucking body 20 attached to the upper stage of the alignment stage 10; a substrate holding means 30 arranged above the mask sucking body 20 and moved up and down; and a camera 40 for observing the alignment situation of the mask with the substrate by imaging an alignment mark on the mask and an alignment mark on the substrate. The mask sucking body 20 comprises a table 21 comprising a porous body and a mechanism for vacuum-sucking the table 21 from the lower surface side. The mask placed on the table is vacuum-sucked and to be aligned with the substrate in such a state that the warpage is corrected and as a result, precise alignment is carried out regardless of the material of the mask such as the metal mask, glass or the film of a non-magnetic body. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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