发明名称 |
DEPOSITION OF LAYERS OF POROUS MATERIALS, LAYERS THUS OBTAINED AND DEVICES CONTAINING THEM |
摘要 |
The present invention describes a process for the deposition of one or more layers of zeolites on rigid supports of various natures and geometry, particularly on silicon wafers. The coating containing zeolites is characterised by pore sizes ranging from 1 Angstrom to a few nanometer units. The deposition process does not interfere with and/or alter the correct functioning of the electronic devices (diodes, bipolar junction transistors, field effect transistors and electronic amplifiers in general) already integrated on the support to be coated on which said deposition is effected. The process according to the invention can be applied to electronic devices and permits their unaltered correct functioning.
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申请公布号 |
US2010117165(A1) |
申请公布日期 |
2010.05.13 |
申请号 |
US20080594810 |
申请日期 |
2008.03.28 |
申请人 |
UNIVERSITA DEGLI STUDI "MAGNA GRAECIA" DICATANZATO |
发明人 |
FIORILLO ANTONINO SECONDO |
分类号 |
H01L29/66;B32B1/00;B32B3/10;B32B3/26;C09D191/00;H01L21/30 |
主分类号 |
H01L29/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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