发明名称 SUBSTRATE PROCESSING SYSTEM
摘要 PURPOSE: A substrate processing system stands in line the location of substrate through the rotation of align eccentric cap. The damage of substrate by the misalignment is prevented. CONSTITUTION: A loading chamber(LC) loads substrate. An unloading chamber(ULC) unloads the substrate provided from the transfer chamber(TC) to outside. At least, 2 processing chambers(PC1, PC2) are arranged in order to be each other opposite to the inline type. The transfer chamber is arranged between the processing chamber.
申请公布号 KR20100046382(A) 申请公布日期 2010.05.07
申请号 KR20080105201 申请日期 2008.10.27
申请人 JUSUNG ENGINEERING CO., LTD. 发明人 CHOI, JAE WOOK
分类号 H01L21/02;H01L21/67 主分类号 H01L21/02
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