PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS

摘要

PURPOSE: A photoresist undercoat forming material and a pattern forming method are provided to increase an extinction coefficient by combining an intermediate layer with the anti-reflection effect. CONSTITUTION: A photoresist undercoat forming material contains a novolac resin. The novolac resin has an aromatic hydrocarbon group with a carbon number of 6 to 30. The aromatic hydrocarbon group is substituted for sulfonate group or amine salt. The novolac resin has a repeated unit of the novolac element of one or two kinds of compounds.