发明名称 MOLD FOR MANUFACTURING PATTERNED FILM, MOLD ASSEMBLY FOR MANUFACTURING PATTERNED FILM, AND METHOD FOR MANUFACTURING THE SAME
摘要 <p>PURPOSE: A mold, a mold assembly for manufacturing a pattern film, and a manufacturing method thereof are provided to manufacture a mold and a mold assembly for manufacturing the pattern film accurately using a micromachining including a photolithography, a dray etching or wet etching, and a plating process. CONSTITUTION: A substrate is prepared(S110). A photoresist pattern is formed on the substrate(S120). An opening corresponding to the shape of a convex unit is formed on the photoresist pattern. A concave unit corresponding to the convex unit is formed on the substrate using the photoresist pattern as a mask(S130). The convex unit corresponding to the concave unit is formed by removing the photoresist pattern from the substrate(S140).</p>
申请公布号 KR20100046712(A) 申请公布日期 2010.05.07
申请号 KR20080105685 申请日期 2008.10.28
申请人 M2N INC. 发明人 PARK, YOUNG GEUN;LEE, HAC JU;JANG, YOUNG JIN;UHM, SANG JIN
分类号 H01L21/027;G03F7/00 主分类号 H01L21/027
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