发明名称 |
MOLD FOR MANUFACTURING PATTERNED FILM, MOLD ASSEMBLY FOR MANUFACTURING PATTERNED FILM, AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
<p>PURPOSE: A mold, a mold assembly for manufacturing a pattern film, and a manufacturing method thereof are provided to manufacture a mold and a mold assembly for manufacturing the pattern film accurately using a micromachining including a photolithography, a dray etching or wet etching, and a plating process. CONSTITUTION: A substrate is prepared(S110). A photoresist pattern is formed on the substrate(S120). An opening corresponding to the shape of a convex unit is formed on the photoresist pattern. A concave unit corresponding to the convex unit is formed on the substrate using the photoresist pattern as a mask(S130). The convex unit corresponding to the concave unit is formed by removing the photoresist pattern from the substrate(S140).</p> |
申请公布号 |
KR20100046712(A) |
申请公布日期 |
2010.05.07 |
申请号 |
KR20080105685 |
申请日期 |
2008.10.28 |
申请人 |
M2N INC. |
发明人 |
PARK, YOUNG GEUN;LEE, HAC JU;JANG, YOUNG JIN;UHM, SANG JIN |
分类号 |
H01L21/027;G03F7/00 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|