发明名称 APPRATUS FOR TREATMENTING SUBSTRATE
摘要 <p>PURPOSE: A substrate processing device is provided to distribute accumulated heat by installing a light diffusion lens on a position corresponding to the center of a substrate receiver which has accumulated heat. CONSTITUTION: A chamber(112) provides a reactive space. A substrate receiver(120) is positioned on the reactive space and receives a substrate. A heating unit includes a lamp, a reflective plate, and an optical lens. The lamp is positioned on the lower side of the chamber and heats the substrate receiver. The reflective plate reflects the light from the lamp. An optical lens is positioned on the lamp.</p>
申请公布号 KR20100046536(A) 申请公布日期 2010.05.07
申请号 KR20080105410 申请日期 2008.10.27
申请人 JUSUNG ENGINEERING CO., LTD. 发明人 LEE, EUY KYU;CHOI, KYU JIN;JEON, YONG HAN;YANG, CHEOL HOON;LEE, TAE WAN
分类号 H01L21/324;H01L21/687 主分类号 H01L21/324
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