APPRATUS FOR TREATMENTING SUBSTRATE

摘要

PURPOSE: A substrate processing apparatus is provided to uniformly heat a substrate receiver by compensating for the heat loss of the peripheral region of the substrate receiver. CONSTITUTION: A chamber includes upper and lower sides made of transparent materials and provides a reactive space. The substrate receiver is positioned on a reactive space and receives the substrate. A heating unit is positioned on the lower side of the chamber and heats the substrate receiver. An edge ring(130) is installed on the inner side of the chamber. A light transmission space(180) is installed between the edge ring and the substrate receiver and transmits light from the heating unit. An upper reflective plate(182) is installed on the upper side of the chamber corresponding to the light transmission space.