| 摘要 |
An imprint method for imprinting a pattern of a mold onto a resin material on a substrate includes a step of forming a first processed area in which an imprint pattern corresponding to the pattern of the mold is formed and an outside area of the resin material at a periphery of the first processed area by bringing the mold into contact with the resin material formed on the substrate; a step of forming a first protection layer, for protecting the first processed area, on the first processed area; and a step of removing a layer of the resin material in the outside area while the imprint pattern formed on a layer of the resin material in the first processed area is protected by the first protection layer so as not to be removed. |
