APPARATUS AND METHOD FOR TREATING SUBSTRATE

摘要

PURPOSE: A substrate processing device and a processing method thereof are provided to minimize the contamination of an exposure stage by supplying a substrate with the cleaned rear to an exposure facility. CONSTITUTION: A substrate processing device(10) includes a coating device(30), and an installation front end module(20). The coating device performs the photoresist coating process for a substrate. The coating device includes a coating unit(200a) coating the photoresist on one side of the substrate and a cleaning unit(300) for cleaning the other side of the substrate coated with the photoresist in the coating unit. The installation front end module transfers the substrate between a container receiving the substrates and the coating device.