| 摘要 |
PURPOSE: A single type substrate processing device and a method for controlling the pressure of the same are provided to efficiently exhaust a fume from a process solution by providing the same exhaust pressure to a suction duct. CONSTITUTION: A single type substrate processing device(1) includes a substrate support unit(200), a chemical supply unit(300), a process container(10), and an exhaust unit. A substrate support unit includes a spin head(210) which the substrate is loaded. The chemical solution supply unit supplies chemical solutions to the substrate. The process container surrounds the spin head and includes a plurality of suction ducts for inputting and suctioning the air and the chemical solution scattered on the substrate and an exhaust duct for the exhaust of the suction duct. The exhaust unit is connected to the exhaust duct and includes a damper for controlling the exhaust quantity according to the exhaust pressure of the exhaust duct.
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