| 摘要 |
PURPOSE: A cleaning apparatus of a substrate processing system is provided to improve cleaning efficiency and cleaning solution use efficiency by spraying a cleaning solution to the substrate while rotating a spray unit. CONSTITUTION: A chamber(10) comprises a constant space. A transfer shaft(20) is installed on the inner side of the chamber. The transfer shaft rotates for transferring the substrate and includes a pulley(26). A first spray unit(30) is installed on the upper side inside the chamber. The first spray unit sprays the chemical solution or cleaning solution on the surface of the substrate. A second spray unit(40) sprays the chemical solution or cleaning solution on the rear of the substrate.
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