LIQUID RECOVERY APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus suppressing outflow of a liquid to the outside of a substrate even when abnormality such as a power fault occurs.

SOLUTION: This exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid by filling a gap between the projection optical system and the substrate with the liquid. The exposure apparatus includes a liquid recovery mechanism with a drive section driven by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.

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